FEATURES OF MAGNETRON SPUTTERING DURING THE DEPOSITION OF TIN-CU COMPOSITE COATINGS FROM A PLASMA OF LOW-PRESSURE VACUUM-ARC AND MAGNETRON DISCHARGES

Dmitrii Tsyrenov, A.P. SEMENOV, E.O. NIKOLAEV
Institute of Physical Materials Science SB RAS, Ulan-Ude, Russian Federation

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Daniil Emlin 2020-09-18 16:15
That is influence of titanium arc on A-V -characteristics of magnetron discharge, and are there possibilities of titanium contamination and deposition coatings on Cu target at high arc currents?

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