shijian zhang2020-09-18 17:12 1. page 2 the XRD patterns were after annealing of irradiated targets or just original targets? how long was the annealing time? what is the heating and cooling rate? how the temperature and cooling rate affect the phase state?
2. page 13 what is the reason for the formation of blisters after annealing of ion implanted samples? did you measure the XRD pattern of this annealed sample? why did you choose to anneal this sample rather than samples treated by CPF?
3. does it mean that CPF treatment with energy density over 8 J/cm2 would destroy the amorphous advantage of this kind of material? or this treatment will bring other new properties to this material?
Nikolai Cherenda2020-09-21 16:39 1. These XRD investigations were carried out on the foils after production. Annealing time was 1 hour. We did not measure heat and cooling rates. In any case the cooling rate was much lower then the critical rate neccessary for amorphization. Temperature stimulate the diffusion process resulting in transition from metastable to stable phase composition.
2. Diffusion of defects, He -defect complexes and pores (blisters) formation. Yes. Annealing and microscopy investigation did not give adequate information on blisters formation in the sample treated by plasma and implanted by helium ions due to developed roughness of the samples after plasma treatment.